Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group
Conferences > FiO > 2008 > FThO > FThO4
  • Frontiers in Optics 2008/Laser Science XXIV/Plasmonics and Metamaterials/Optical Fabrication and Testing
  • OSA Technical Digest (CD) (Optica Publishing Group, 2008),
  • paper FThO4
  • •https://doi.org/10.1364/FIO.2008.FThO4

Imaging beyond the diffraction limit via dark states

George R. Welch, Hebil Li, Vladimir Sautenkov, Michael M. Kash, Alexei V. Sokolov, Yuri V. Rostovtsev, M. Suhail Zubairy, and Marlan O. Scully

Not Accessible

Your library or personal account may give you access

Abstract

We study the possibility of creating spatial patterns smaller than the diffraction limit using the so-called dark states formed by the interaction between atoms and optical fields.

© 2008 Optical Society of America

PDF Article
More Like This
Subwavelength imaging via dark state

Hebil Li, Vladimir Sautenkov, Michael Kash, George R. Welch, Yuri V. Rostovtsev, and Marlan O. Scully
QThH5 Quantum Electronics and Laser Science Conference (CLEO:FS) 2008

Subwavelength resolution via dark state

Yuri V. Rostovtsev and Marian O. Scully
FTuI4 Frontiers in Optics (FiO) 2007

Resonant Interferometric Lithography beyond the Diffraction Limit

Jörg Evers, Martin Kiffner, and M. Suhail Zubairy
QTuB4 International Conference on Quantum Information (QIM) 2008

View More...
Select as filters
Select Topics Cancel
Top
       
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.
Privacy | Terms of Use