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Conferences > IGWO > 1986 > THCC > THCC10

Electron-beam lithography for formation of submicrometer gratings in semiconductor integrated optoelectronics

J. McInerney, M. J. Fice, and H. Ahmed

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Abstract

Injection lasers and other components using microgratings promise to form important parts of integrated optoelectronic and all-optical systems. Of particular interest are low-order gratings for distributed feedback lasers, especially GaInAsP/InP devices emitting at 1.55 μm.1 Other potential applications include filtering and demultiplexing of guided-wave optical signals.

© 1986 Optical Society of America

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