Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Optimization of electric field profiles in semiconductor electrooptic devices

Not Accessible

Your library or personal account may give you access

Abstract

III–V semiconductors allow considerable flexibility in the design of electrooptic waveguide devices because of the ability to control the profiles of optical and applied electric fields independently. Doping variations, including p – n junctions, are used to control the profile of the electric field, while changes in composition are used to provide the appropriate refractive-index profiles that determine the optical mode shape and position. A figure of merit for many electrooptic devices is the change in propagation constant with voltage (δ/β/V). For a slab waveguide δ/β/V = F × G with where ψ(x) is the optical field, and E(x) is the applied electric field. F can be considered as an overlap factor and is independent of wavelength and material properties.

© 1986 Optical Society of America

PDF Article
More Like This
Quantum well self-electrooptic effect devices

D. A. B. Miller
WE5 OSA Annual Meeting (FIO) 1986

Nondestructive technique for rapidly assessing the stability of lithium niobate electrooptic waveguide devices

A. R. Beaumont, B. E. Daymond-John, W. A. Stallard, and R. C. Booth
FAA2 Integrated and Guided Wave Optics (IGWO) 1986

Observation of electric field enhanced electrode indiffusion in lithium niobate

S. Kim, R. V. Johnson, and Armand R. Tanguay
THG1 OSA Annual Meeting (FIO) 1986

Select as filters


Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All rights reserved, including rights for text and data mining and training of artificial technologies or similar technologies.