Abstract

One of the most important issues in integrated-optic applications of Ti:LiNbO₃ waveguides is the uniformity of driving voltage among device elements fabricated on a single chip. In LiNbO₃-based matrix switches using directional coupler switch elements, scatter of the switching voltage has been reported.^1,2 We report on a novel method of measuring a spatial variation of the electro-optic effect on a number of positions on x- and z-cut LiNbO₃ substrates in Ti-diffused form.

© 1990 Optical Society of America