Multispectral color filters based on self-aligned dual plasmonic gratings fabricated by nano-imprint lithography

Kristof Lodewijks; Bharathkumar Mareddi; Bharathkumar Mareddi; Rongchen Qin; Rongchen Qin; Anabel De Proft; Anabel De Proft; Bruno Figeys; Ugo Stella; Myriam Willegems; Roelof Jansen; Xavier Rottenberg; Eleonora Storace; Bogumila Kutrzeba-Kotowska

doi:10.1364/IPRSN.2022.IW4B.2

Optica Advanced Photonics Congress 2022
Technical Digest Series (Optica Publishing Group, 2022),
paper IW4B.2
•https://doi.org/10.1364/IPRSN.2022.IW4B.2

Multispectral color filters based on self-aligned dual plasmonic gratings fabricated by nano-imprint lithography

Kristof Lodewijks, Bharathkumar Mareddi, Rongchen Qin, Anabel De Proft, Bruno Figeys, Ugo Stella, Myriam Willegems, Roelof Jansen, Xavier Rottenberg, Eleonora Storace, and Bogumila Kutrzeba-Kotowska

Integrated Photonics Research, Silicon and Nanophotonics 2022

Maastricht,Limburg Netherlands
24–28 July 2022
ISBN: 978-1-957171-16-6

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Plasmons and Modulators (IW4B)

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K. Lodewijks, B. Mareddi, R. Qin, A. De Proft, B. Figeys, U. Stella, M. Willegems, R. Jansen, X. Rottenberg, E. Storace, and B. Kutrzeba-Kotowska, "Multispectral color filters based on self-aligned dual plasmonic gratings fabricated by nano-imprint lithography," in Optica Advanced Photonics Congress 2022, Technical Digest Series (Optica Publishing Group, 2022), paper IW4B.2.

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Abstract

Multispectral plasmonic color filters were fabricated using nano-imprint lithography and benchmarked to similar filters fabricated with standard CMOS processing. The self-aligned process yields devices with narrow linewidths below 30nm and up to 50% transmission efficiency.

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