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  • International Quantum Electronics Conference
  • 1996 OSA Technical Digest Series (Optica Publishing Group, 1996),
  • paper ThG4

Contaminant removal from glass substrates using UV laser radiation

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Abstract

Micron and sub-micron sized particulate contamination results in some 50% of the total yield loss in semiconductor device manufacture [1], it can scatter or absorb light incident on optical components, and can affect the tribology of devices like hard disk drives. Adhesion forces between submicron particles and substrates, such as Van der Waals, capillary and electrostatic forces [2], can be millions of times greater than gravitational forces.

© 1996 Optical Society of America

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