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Conferences > LACA > 1992 > ThA > ThA4

Multiphoton Ionization Spectra of SiH3 and SiCl3 Radicals

J. W. Hudgens, R. D. Johnson, and K. K. Irikura

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Abstract

We will present electronic spectra of the SiH3 and SiCl3 transient free radicals which were observed using resonance enhanced multiphoton ionization (REMPI) spectroscopy. These free radicals are believed to play important roles during the chemical vapor deposition of silicon films from the feed gases SiH4 and SiHCl3. Prior to these studies, no electronic states of these radicals were known. The spectra reported here may form the bases of new optical detection methods for these species.

© 1992 Optical Society of America

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