Add to BibSonomyAbstract
Metal Organic Chemical Vapor Deposition (MOCVD) is a powerful technique for the generation of well-defined layers of metals and semiconductors [1]. Extending MOCVD by the use of lasers to Laser-MOCVD, selective area growth can be obtained ([2] and references therein). Laser induced deposition of structured aluminum films can be achieved using UV lasers and Al-alkyls like triisobutylaluminum (TIBA) as gaseous organometallic precursor [3, 4].
© 1987 Optical Society of America
PDF ArticleMore Like This
Excimer and dye laser-induced photochemistry of CH3TeTeCH3 and CH3TeCH3 monitored by time-of-flight laser multiphoton ionization spectroscopy
M. Stuke
FN2 Conference on Lasers and Electro-Optics (CLEO:S&I) 1984
Laser mass spectroscopy for laser CVD
R. Larciprete, M. Stuke, and V. Magni
TUE3 Conference on Lasers and Electro-Optics (CLEO:S&I) 1986
Liquid encapsulated laser chemical vapor deposition of A1
H. W. Lee and S. D. Allen
CFL1 Conference on Lasers and Electro-Optics (CLEO:S&I) 1991