Resonantly-Enhanced Multiphoton Ionization Photoelectron Angular Distributions for Xenon

P. R. Blazewicz; R. N. Compton; J.A.D. Stockdale; John C. Miller

doi:10.1364/MEA.1986.MA4

Topical Meeting on Multiple Excitations of Atoms
Technical Digest Series (Optica Publishing Group, 1986),
paper MA4
•https://doi.org/10.1364/MEA.1986.MA4

Resonantly-Enhanced Multiphoton Ionization Photoelectron Angular Distributions for Xenon

P. R. Blazewicz, R. N. Compton, J.A.D. Stockdale, and John C. Miller

Multiple Excitations of Atoms 1986

Seattle, Washington United States
20–22 October 1986
ISBN:

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Above Threshold Excitation and Ionization: 1 (MA)

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P. R. Blazewicz, R. N. Compton, J. A. D. Stockdale, and J. C. Miller, "Resonantly-Enhanced Multiphoton Ionization Photoelectron Angular Distributions for Xenon," in Topical Meeting on Multiple Excitations of Atoms, Technical Digest Series (Optica Publishing Group, 1986), paper MA4.

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Abstract

Multiphoton ionization (MPI) of Xe atoms resonantly enhanced through the three-photon allowed $6 s {[3 / 2]}_{1}^{0}$ and $6 s^{'} {[1 / 2]}_{1}^{0}$ states has been extensively studied for high- and low-gas densities (see, e.g., Ref. ¹). Limited data exist on the angular distributions of the photoelectrons ejected under these conditions.^2,3

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