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Conferences > MSBA > 1989 > MC > MC4

Adsorption of Disilane and Hydrogen on Si (111)-7x7 Studied by Multiple Internal Reflection Infrared Spectroscopy

K.J. Uram and U. Jansson

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Abstract

The chemisorption of Si2H6 and atomic hydrogen on a Si (111)-7x7 surface has been studied over a temperature range of 100K-500K using multiple internal reflection infrared spectroscopy. The high resolution and polarization selection rules enable us to identify specific adsorbed SiHx species. The characterization and comparison of surface species derived from the adsorption of Si2H6 and hydrogen give insight into the effect of local geometry on vibrational frequency and also increases our understanding of the chemical vapor deposition of silicon from silanes.

© 1989 Optical Society of America

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