XPS Studies of Halogen Atom Beam Interactions with Electronic Materials

Andrew Freedman; Charter D. Stinespring

doi:10.1364/MSBIP.1991.WC4

Microphysics of Surfaces: Beam-Induced Processes
Technical Digest Series (Optica Publishing Group, 1991),
paper WC4
•https://doi.org/10.1364/MSBIP.1991.WC4

XPS Studies of Halogen Atom Beam Interactions with Electronic Materials

Andrew Freedman and Charter D. Stinespring

The Microphysics of Surfaces: Beam-Induced Processes 1991

Santa Fe, New Mexico United States
11–13 February 1991
ISBN:

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Poster Session (WC)

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A. Freedman and C. D. Stinespring, "XPS Studies of Halogen Atom Beam Interactions with Electronic Materials," in Microphysics of Surfaces: Beam-Induced Processes, Technical Digest Series (Optica Publishing Group, 1991), paper WC4.

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Abstract

XPS studies of halogen atom beam (fluorine and chlorine) interactions with diamond (100) and GaAs (100) surfaces will be presented.

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