Nanolithography

R. Fabian Pease

doi:10.1364/MSBIP.1991.WD2

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Conferences > MSBIP > 1991 > WD > WD2

Microphysics of Surfaces: Beam-Induced Processes
Technical Digest Series (Optica Publishing Group, 1991),
paper WD2
•https://doi.org/10.1364/MSBIP.1991.WD2

Nanolithography

R. Fabian Pease

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R. Fabian Pease

Stanford University, Stanford, CA 94305-4055

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R Pease

The Microphysics of Surfaces: Beam-Induced Processes 1991

Santa Fe, New Mexico United States
11–13 February 1991
ISBN:

From the session
Nanoscale Structure and Lithography (WD)

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R. F. Pease, "Nanolithography," in Microphysics of Surfaces: Beam-Induced Processes, Technical Digest Series (Optica Publishing Group, 1991), paper WD2.

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- Nanolithography

Abstract

Abstract

Our ability of fashion patterns with features below 100nm is beginning to be put to good use for the microfabrication of devices and even circuits. Achieving economic throughput along with the precision required for sub 100-nm features is an enormous challenge.

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The Microphysics of Surfaces: Beam-Induced Processes 1991
Santa Fe, New Mexico United States
11–13 February 1991
ISBN:
From the session Nanoscale Structure and Lithography (WD)

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