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Damage Threshold and Environmental Durability Of Oxide Coatings Deposited Using Ion Assisted Deposition

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Abstract

The optical, physical and chemical properties of materials in thin film form can vary significantly from bulk properties. These differences in properties are directly related to film microstructure which is predominantly columnar, containing voids and material inhomogeneities. A number of novel deposition techniques have been developed in attempts to improve the properties of thin films. In these techniques, energetic processes are employed to increase adatom mobility and eliminate the formation of columnar microstructure. One of these techniques is ion assisted deposition (IAD).

© 1987 Optical Society of America

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