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Optical materials deposited using ion beam sputtering

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Abstract

Selected optical materials were deposited using combined ion beam sputter and ion-assisted deposition techniques. The influence of ion energy and current density on the properties of a growing film is discussed. Measured properties include optical constants, mechanical properties, microstructure, and stoichiometry. Optical materials include zirconia, titania, silica, aluminum nitride, and silicon nitride. Recent roughness measurements on ion sputter deposited over coated aluminum films are discussed.

© 1985 Optical Society of America

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