Abstract

Limitations on the accuracy and precision of traditional linewidth measurement techniques are being revealed, as artifacts having finer geometries and smaller tolerances are produced, e.g., in the manufacture of very high density silicon integrated circuits. In optical microscopy, where the width of an object is determined by measurement of its magnified image, apparent changes in linewidth accompany any degradation of the line image. A number of contributing factors such as aberration and defocus of the optics, and spatial coherence of the illuminating source have been previously discussed.¹

© 1986 Optical Society of America