Abstract

The practical problems of using ion-assisted deposition with substrate rotation are discussed, including the role of ion energy vs total ion flux. We compare MgF₂, ZrO₂, and SiO₂ films made conventionally and with intermittent ion bombardment in terms of optical performance and stoichiometry. Vacuum-to-air shifts of the peak wavelength are significantly reduced in narrowband filters of ZrO₂/SiO₂. Also discussed is the relation between which layers are bombarded and peak wavelength shift; i.e., does the entire filter need to be bombarded or just a few critical layers? We also investigated stress reduction in MgF₂ films.

© 1986 Optical Society of America