Ion-assisted deposition of fluoride optical thin films

J. D. Targove; B. G. Bovard; J. P. Lehan; M. J. Messerly; C. C. Weng

doi:10.1364/OAM.1986.MQ1

Annual Meeting Optical Society of America
Technical Digest Series (Optica Publishing Group, 1986),
paper MQ1
•https://doi.org/10.1364/OAM.1986.MQ1

Ion-assisted deposition of fluoride optical thin films

J. D. Targove, B. G. Bovard, J. P. Lehan, M. J. Messerly, and C. C. Weng

OSA Annual Meeting 1986

Seattle, Washington United States
19–25 October 1986
ISBN:

From the session
Thin-Film Processes and Materials (MQ)

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J. D. Targove, B. G. Bovard, J. P. Lehan, M. J. Messerly, and C. C. Weng, "Ion-assisted deposition of fluoride optical thin films," in Annual Meeting Optical Society of America, Technical Digest Series (Optica Publishing Group, 1986), paper MQ1.

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Abstract

We prepared optical thin films of several fluoride materials using ion-assisted deposition. The materials were selected for their transmittance in the near ultraviolet and include LaF₃, CeF₃, NdF₃, and cryolite. We investigated the effects of the ion species, beam energy, and beam current density on thin-film properties.

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