Abstract

Titanium nitride plays an important role in architectural optics and has great potential for visible and infrared precision optics. Characterized by unusual hardness and durability, titanium nitride has many of the optical properties of metals. But optical and physical performance depend critically on achieving near-stoichiometric conditions. Direct and indirect methods are compared for assessing thin film stoichiometry. Direct methods include Rutherford backscattering (RBS), Auger, and x-ray fluorescence. Indirect methods include measuring electrical properties (bulk resistivity), optical constants (ellipsometry), and color (CIE, Lab Hunter). Data obtained for sputtered titanium nitride films using these methods are correlated with results of hardness and abrasion tests (Taber Abraser, MIL-Spec Eraser Test, coefficient of friction scratch test, and indentation methods).

© 1989 Optical Society of America