Abstract

We have developed programs which run on personal computers such as IBM PC. Using these programs along with a computer aided design (CAD) program such as, Autocad, one can completely design and layout mask patterns of photonic devices on a personal computer. Two additional features are needed to make a CAD program useful for designing mask patterns. One is the handling of shapes with arbitrary angle such as a waveguide bend. We have pattern fracturing programs which can break up any shape into rectangles. The output of the fracturing program is a script file. Autocad can read in the script file and compose the shape. The other feature needed is the conversion between the Autocad database and the mask description format, Calma GDSII. We have written a set of utility programs to convert an Autocad database in the DXF format to the Calma GDSII format. We can also backconvert from the GDSII to the script files. This procedure can be used to verify that the conversion process is error-free. The entire procedure is automated by running programs in the batch mode. We have designed waveguide devices consisting of Y- branch, S-shaped bend, directional coupler, etc., and electrode patterns. By using different magnification factors for the x and y axes, all details of a waveguide device can be viewed on the graphics screen.

© 1989 Optical Society of America