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Raman characterization of TiO2 and ZrO2 thin films deposited by low voltage reactive ion plating

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Abstract

The addition of an optical multichannel analyzer to the Raman microprobe at the University of Alabama in Huntsville allows instantaneous scanning of the Raman spectrum, improving the sensitivity of the technique and providing better signal-to-noise ratio for multiple data acquisition. We fabricated single layer thin films of ZrO2 and TiO2 by low voltage reactive ion plating deposition in a Balzers BAP 800 coating system at the University of Central Florida. We also deposited multilayer quarterwave stacks of these materials with SiO2 for the low index layers, all centered at the Raman excitation wavelength of 514 nm.

© 1989 Optical Society of America

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