Abstract

Low voltage ion plating technique has become more and more interest in the deposition of thin films with very high packing density and good adhersion properties. Current works in the world are concerned mainly on the films of oxides [1], [2], the films were prepared by evaporating correspondent metals or suboxides materials in a plasma cloud, and with a reaction of oxygen ions to form a correct stoichiometric oxide films.

© 1992 Optical Society of America