Abstract

Simulated annealing has been incorporated to extract the exact silver-ion concentration profile in both planar and channel silver waveguides. Planar silver waveguides were produced by using electric-field-assisted silver indiffusion techniques, and silver channel waveguides were produced by ion implantation. A scanning electron microbeam using wavelength dispersive x-ray-fluorescence analysis was used to measure the silver concentration profiles for both planar and channel waveguides.

© 1990 Optical Society of America