Abstract

The improved resolution, sensitivity, and uniformity of CCD cameras, and their lower cost, make them more cost-effective than scanning detector systems when used in combination with frame grabbers for computer-based measurements of waveguide attenuation. We report on the use of a high-resolution (768 493 pixels) Hamamatsu C3077 CCD camera for measuring the mode propagation losses of high-index oxide waveguides on oxidized Si wafers. The waveguides were deposited by electron-beam evaporation, reactive low-voltage ion plating, or RF sputtering. To achieve high spatial resolution, we used a fixed-aperture, fixed-focus macro lens at 1.6 reduction to image a 1.5 cm 1.0 cm area onto the CCD. The camera is interfaced with a computer by means of a Data Translation frame grabber for fast data acquisition and analysis. Using this two-dimensional camera will allow us to characterize the size and distribution of defects and to measure propagation losses. Measurements are possible over a wide range of losses from 1 dB/cm to 50 dB/cm with a spatial resolution of 50 m. Loss measurement accuracy, which is alignment dependent, will be examined.

© 1990 Optical Society of America