Expand this Topic clickable element to expand a topic
Skip to content
Optica Publishing Group

Effects of source geometry on imaging in a soft-x-ray projection lithography system

Open Access Open Access


We are doing physical optics modeling of soft-x-ray projection lithography experiments; the wavelength is 14 nm, and the desired feature size on the wafer is 100 nm. The projection optics consist of an off-axis, two-mirror Schwarzschild operating at f/5. The condenser optics are arranged in Köhler geometry for two different x-ray source types. An off-axis elliptical mirror is used to image an x-ray plasma source into the entrance pupil of the Schwarzschild. The other source is an XUV undulator storage ring. Its output radiation is brought to a focus in the entrance pupil and then scanned in a circle. We change the geometries to vary the amount of partial coherence. We also examine the effects of aberrations in the condenser.

© 1992 Optical Society of America

PDF Article
More Like This
Image degradation in a soft x-ray projection lithography system due to diffraction phenomena in the condenser

William C. Sweatt and George N. Lawrence
TuI4 OSA Annual Meeting (FIO) 1992

Physical Optics Modeling in Soft-X-Ray Projection Lithography

William C. Sweatt and George N. Lawrence
TuA3 Soft X-Ray Projection Lithography (SXRAY) 1992

High-resolution soft-x-ray projection imaging using Schwarzschild optics and a laser plasma source

D. A. Tichenor, G. D. Kubiak, M. E. Malinowski, R. H. Stulen, S. J. Haney, K. W. Berger, L. A. Brown, W. C. Sweatt, J. E. Bjorkholm, J. Bokor, R. R. Freeman, M. D. Himel, T. E. Jewell, A. A. MacDowell, W. M. Mansfield, D. M. Tennant, W. K. Waskiewicz, D. L. White, D. L. Windt, and O. R. Wood
MVV5 OSA Annual Meeting (FIO) 1992

Select as filters

Select Topics Cancel
© Copyright 2024 | Optica Publishing Group. All Rights Reserved