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We report our progress on the modelling of the soft X-ray projection lithography imaging experiments that are being performed at Sandia National Laboratories and at AT&T Bell Laboratories. The system is shown in Fig. 1. It uses an elliptical mirror (condenser) to image a laser generated x-ray plasma source onto the entrance pupil of a Schwarzchild camera. The camera then images the mask onto the semiconductor wafer.
© 1993 Optical Society of America
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