Abstract
Extreme-ultraviolet (XUV) projection lithography using 60-80 nm illumination is a potential method for mass producing 1-GBit integrated circuits with subsequent extendibility to 4- and 16-GBits via phase-shift masks.
© 1993 Optical Society of America
PDF ArticleMore Like This
Richard L. Sheffield, Bruce E. Carlsten, K. C. Dominic Chan, John C. Goldstein, Michael T. Lynch, Brian E. Newnam, Dinh C. Nguyen, Daniel S. Prono, and Roger W. Warren
PD1 Soft X-Ray Projection Lithography (SXRAY) 1992
V. K. Viswanathan and Brian E. Newnam
FB2 Soft X-Ray Projection Lithography (SXRAY) 1991
Brian E. Newnam and V. K. Viswanathan
MB2 Soft X-Ray Projection Lithography (SXRAY) 1992