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Photopolymers as vectorial sensors of the electric field

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Abstract

We propose to use radially, azimuthally and circularly polarized Bessel beams as inhomogeneous illuminating system to unambiguously analyze the vectorial optical response of azo-dye polymers. It is shown that the well-known sensitivity of azo-dye molecules to polarization direction gives rise to surface deformations which are proportional to the longitudinal electric-field component. This property opens a large field of applications in the vectorial analysis of light fields, especially for nano-optics/nanophotonics.

©2006 Optical Society of America

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Figures (5)

Fig. 1.
Fig. 1. Characterization of functions J02 and J12. (a): plots of J02 (solid curve) and J12 (dashed curve); (b) and (c): spatial distributions of J02(r) and J12(r), respectively, calculated in polar coordinates.
Fig. 2.
Fig. 2. Longitudinal cross sections of the intensity distributions numerically simulated in the PMMA-DR1 layer with (a) radially polarized, (b) circularly polarized and (c) az-imuthally polarized Bessel beams.
Fig. 3.
Fig. 3. Recording setup.
Fig. 4.
Fig. 4. Characterization of the optical response of the PMMA-DR1 layer illuminated with a radially polarized Bessel beam ((a)-(d)), a circularly polarized Bessel beam ((e)-(h)) and an azimuthally polarized Bessel beam ((i)-(k)). (a),(e),(i): |ET |2, experiments; (b),(f): |EL |2, theory; (c),(g),(j): topography of the photoinduced surface relief pattern; (d),(h),(k): plots of |ET |2 profiles (theory: top dashed curves, experiments: top solid curves), |EL |2 profiles (bottom dashed curves) and topography acquisition profiles (bottom solid curves). Profile width : 2 μm. (l): comparison between the profiles of the surface imprint and the one calculated with the gradient force model [15], illumination with a radially polarized Bessel beam.
Fig. 5.
Fig. 5. (a): Longitudinal cross section of the intensity simulated in the PMMA-DR1 layer illuminated with a highly convergent radially polarized Bessel beams; (b): Transverse cross section along the white line of (a); (c): Topography of the surface relief pattern. λ = 488 nm.

Equations (6)

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E T 2 = C cos 2 θ t pT 2 J 1 2 ( αr ) ,
E L 2 = C sin 2 θ t PL 2 J 0 2 ( αr ) ,
E T 2 = C cos 2 θ t pT 2 J 1 2 ( αr ) ,
E L 2 = 0 ,
E T 2 = C π [ t s + t pT cos θ 2 J 0 2 ( αr ) + t s t pT cos θ 2 J 2 2 ( αr ) ] ,
E L 2 = 4 C π sin 2 θ t pL 2 J 1 2 ( αr ) ,
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