HeCd Phase Measuring Interferometer Used in Photolithographic Lens Manufacture

Richard Mahany

doi:10.1364/OFT.1990.OWA2

Optical Fabrication and Testing
Technical Digest Series (Optica Publishing Group, 1990),
paper OWA2
•https://doi.org/10.1364/OFT.1990.OWA2

HeCd Phase Measuring Interferometer Used in Photolithographic Lens Manufacture

Richard Mahany

Optical Fabrication and Testing 1990

Monterey, California United States
12–14 June 1990
ISBN:

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System Testing (OWA)

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R. Mahany, "HeCd Phase Measuring Interferometer Used in Photolithographic Lens Manufacture," in Optical Fabrication and Testing, Technical Digest Series (Optica Publishing Group, 1990), paper OWA2.

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Abstract

Phase measuring interferometers have long been used as metrology systems in the manufacturing of precision optical elements and lens systems. Their computational power coupled with recent advances in rapid data taking permit users to perform complex analysis in a cost effective fashion. This paper will describe the use of a commercially available PMI Software System which was integrated with a specialized interferometer design to perform in process testing of a precision photolithographic objective lens.

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