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It has been shown that high-resolution imaging at soft x-ray wavelengths is possible.1 Experiments performed using a 20:1 reduction Schwarzschild camera show that 0.1 µm features can be fabricated using soft x-ray projection lithography (SXPL), but this system is impractical for lithography for several reasons including its small field of view (25 µm × 50 µm). This paper discusses our metrology efforts in testing both the individual mirrors and alignment of a 10× Schwarzschild camera that has a 0.4 mm diameter field of view.
© 1992 Optical Society of America
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