Abstract

Surface modification layers on optical glasses are investigated by means of MAI-MWL (multiple angle of incidence, multiple wavelength) ellipsometry. These modifications in the near-surface region are caused by polishing and cleaning processes.

The device used is a special ellipsometer arrangement using only absolutely necessary elements but allowing fast and very accurate measurements, especially for ultra-thin films. While the basic principle was reported in a previous paper /1/, further improvements of device and evaluation techniques are described. The latter will mainly include residual roughness, which cannot be neglected for the ultra-weak modification layers.

© 1994 Optical Society of America