Technological Aspects of Deep Proton Lithography for the Fabrication of Micro-optical Elements for Optical Interconnects

H. Thienpont; P. Vynck; P. Tuteleers; H. Ottevaere; V. Baukens; G. Verschaffelt; S. Kufner; M. Kufner; A. Hermanne; A. Hermanne; I. Veretennicoff

doi:10.1364/OFT.1998.OTuE.4

Optical Fabrication and Testing
Technical Digest Series (Optica Publishing Group, 1998),
paper OTuE.4
•https://doi.org/10.1364/OFT.1998.OTuE.4

Technological Aspects of Deep Proton Lithography for the Fabrication of Micro-optical Elements for Optical Interconnects

H. Thienpont, P. Vynck, P. Tuteleers, H. Ottevaere, V. Baukens, G. Verschaffelt, S. Kufner, M. Kufner, A. Hermanne, and I. Veretennicoff

Optical Fabrication and Testing 1998

Kailua-Kona, Hawaii United States
8–10 June 1998
ISBN:

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Advances in Micro-optics Fabrication (OTuE)

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H. Thienpont, P. Vynck, P. Tuteleers, H. Ottevaere, V. Baukens, G. Verschaffelt, S. Kufner, M. Kufner, A. Hermanne, and I. Veretennicoff, "Technological Aspects of Deep Proton Lithography for the Fabrication of Micro-optical Elements for Optical Interconnects," in Optical Fabrication and Testing, Technical Digest Series (Optica Publishing Group, 1998), paper OTuE.4.

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Abstract

The technology of deep proton lithography in PMMA (poly methyl methacrylate) is a fabrication method for monolithic integrated refractive micro-optical elements and micro-mechanical holder structures, which allows structural depths in the order of several hundred microns[1,2]. Different optical functions can be fabricated in one block and form monolithic integrated optical systems. In addition mechanical support structures and alignment features can be integrated with these optical systems. This paper will focus mainly on the technological requirements of the irradiation, development and diffusion setups, which are necessary to achieve predictable and reproducible results.

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