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Conferences > OIC > 1988 > TuC > TuC3

Measurement of the Thermal Conductivity of Dielectric Thin Solid Films with a Thermal Comparator

C. A. Amsden, S. E. Gilman, S. D. Jacobs, and J. S. Torok

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Abstract

In 1984 Decker, et al.1 reported the measurement of thermal conductivity for freestanding thin films of SiO2 and Al2O3. Values were found to be one or two orders of magnitude lower than those for the corresponding bulk materials. The authors attributed this difference to the unique microstructure of dielectric thin films, which, along with defects and impurities, would be expected to reduce the phonon mean free path, and thus conductivity. Work by others has recently reinforced these findings for other dielectric coatings.2

© 1988 Optical Society of America

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