Ellipsometry of light scattering from thin film multilayers

C. Deumié; H. Giovannini; G. Albrand; H. Akhouayri; Claude Amra

doi:10.1364/OIC.1995.WB15

Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1995),
paper WB15
•https://doi.org/10.1364/OIC.1995.WB15

Ellipsometry of light scattering from thin film multilayers

C. Deumié, H. Giovannini, G. Albrand, H. Akhouayri, and Claude Amra

Optical Interference Coatings 1995

Tucson, Arizona United States
5–9 June 1995
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C. Deumié, H. Giovannini, G. Albrand, H. Akhouayri, and C. Amra, "Ellipsometry of light scattering from thin film multilayers," in Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1995), paper WB15.

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Abstract

Many studies are devoted to the study of light scattering¹ in multilayer optics, and enable to improve our knowledge of microstructural parameters such as interface roughnesses and bulk inhomogeneities inside the stacks. However these studies are mainly based on the intensity of the scattered light, while phase measurements may provide additional and precious information when analysing the scattering data.

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