Materials for the deposition of thin films

V. Kirilenko

doi:10.1364/OIC.1995.WC3

Optical Interference Coatings
Technical Digest Series (Optica Publishing Group, 1995),
paper WC3
•https://doi.org/10.1364/OIC.1995.WC3

Materials for the deposition of thin films

V. Kirilenko

Optical Interference Coatings 1995

Tucson, Arizona United States
5–9 June 1995
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V. Kirilenko, "Materials for the deposition of thin films," in Optical Interference Coatings, Technical Digest Series (Optica Publishing Group, 1995), paper WC3.

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Abstract

Development of the modern optics call forth to create new optical elements with new properties. As the result of fundamental investigations in chemistry and technology of oxides, fluorides and chalcogenides of some elements, it was developed a creation of new high purity materials for the deposition of thin films for various applications.

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