Abstract

The use of laser or lamp radiation to induce or enhance the growth of thin films at reduced temperatures has received considerable attention over the last decade. The underlying principle relies on the photo-dissociation of precursors in the gas phase by a highly energetic flux of ultraviolet (UV) photons, leading to material deposition on a nearby substrate. The use of excimer lasers in particular with their capabilities of providing vacuum ultraviolet (VUV) wavelengths has brought about exciting possibilities for direct photo-dissociation of a wide range of thin films from a variety of standard and novel precursors.

© 1995 IEEE