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Vacuum deposition of biaxial films with surface-aligned principal axes and large birefringence Δn

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Abstract

Birefringent thin films enable the construction of polarizing elements for use with light at normal incidence. Vacuum deposition at angle θv on to a stationary substrate leads to the growth of a biaxial film with a columnar nanostructure tilted at angle ψ with respect to the substrate normal.1, axis-1 is in the deposition plane parallel to the columns and axis-2 is also in the deposition plane but perpendicular to the columns. Axis-3 is perpendicular to the deposition plane, and hence parallel to the surface. Typical values of the column angle and the birefringence, for zirconium oxide deposited at θv = 60°, are ψ ≈ 30°, n1 n2 ≈ 0.31, n1 n3 ≈ 0.17 and n3 n2 ≈ 0.14. However, for light incident normally on such a film, the difference between the refractive indices associated with the p-polarization (parallel to the deposition plane) and the s-polarization (perpendicular to the deposition plane) is Δn = ns np ~ 0.07. Thus, only a fraction of the maximum available birefringence of a tilted-columnar film is accessed by light incident normally on the coating. Another disadvantage is that oblique deposition on to a stationary substrate leads to a film with uneven thickness.

© 1998 Optical Society of America

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