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Conferences > OIC > 2001 > ThB > ThB8

Development of Optical Coatings for 157nm Lithography (II’ Multilayer Coatings)

Minoru Otani, Shunsuke Niisaka, Ryuji Biro, Yasuyuki Suzuki, Tadahiko Saito, Jun Saito, Akira Tanaka, Chidane Ouchi, Masanobu Hasegawa, Kazuho Sone, and Akira Matsumoto

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Abstract

The optical characteristics (transmittance, reflectance, absorptance) of the antireflection coatings and high reflection mirrors for 157nm which were supplied from the 4 companies in Japan were compared and evaluated.

© 2001 Optical Society of America

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