Particle generation during reactive magnetron sputtering of SiO2 with cylindrical and planar cathodes

M. Vergöhl; D. Rademacher

doi:10.1364/OIC.2010.TuD3

Optical Interference Coatings
OSA Technical Digest (Optica Publishing Group, 2010),
paper TuD3
•https://doi.org/10.1364/OIC.2010.TuD3

Particle generation during reactive magnetron sputtering of SiO₂ with cylindrical and planar cathodes

M. Vergöhl and D. Rademacher

Optical Interference Coatings 2010

Tucson, Arizona United States
6–11 June 2010
ISBN: 978-1-55752-891-9

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Deposition Control and Applications (TuD)

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M. Vergöhl and D. Rademacher, "Particle generation during reactive magnetron sputtering of SiO2 with cylindrical and planar cathodes," in Optical Interference Coatings, OSA Technical Digest (Optica Publishing Group, 2010), paper TuD3.

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Abstract

SiO₂ layers were deposited by pulsed reactive magnetron sputtering with cylindrical and planar dual magnetrons. The particle density in SiO₂ films deposited at different process parameters is analyzed.

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