Abstract

The combination technology of inductively coupled plasma-reactive ion etching (ICP-RIE) and nano-size sphere lithography (NSL) is applied to produce the nano-scale zinc oxide column rod array. The polystyrene nanospheres function as the mask of the lithography when the nanospheres are coated and covered over the zinc oxide film. The diameter of the polystyrene sphere can be adjusted by modulation of oxygen plasma etching powers. The zinc oxide rod array with 54 nm rod diameter can be obtained by properly controlled mixture of methane, hydrogen and argon gases.

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