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Spectroscopic ellipsometry is an optical technique which can provide the depolarization ratio between s or p polarized waves after reflection on a sample. This method is indirect but subsequent multilayer modelling and different techniques such as iterative calculations or nonlinear regressions1 allow to infer the thicknesses and the optical properties of the films. In the case of thick uniaxial films, the angle of incidence must be varied so as to provide a sufficient number of significative and independant data2. This technique has been used to characterize electrooptic polymeric films through the different processing steps3 and could be used for 'on-line' characterization of polymeric devices4.
© 1993 Optical Society of America
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