Stress in Multilayers and Thin Films

C. A. Volkert; D. L. Windt; W. K. Waskiewicz; J. A. Liddle; H. A. Huggins

doi:10.1364/PXRAYMS.1994.WA.2

Physics of X-Ray Multilayer Structures
Technical Digest Series (Optica Publishing Group, 1994),
paper WA.2
•https://doi.org/10.1364/PXRAYMS.1994.WA.2

Stress in Multilayers and Thin Films

C. A. Volkert, D. L. Windt, W. K. Waskiewicz, J. A. Liddle, and H. A. Huggins

Physics of X-Ray Multilayer Structures 1994

Wyoming United States
14–17 March 1994
ISBN:

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Stability (WA)

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C. A. Volkert, D. L. Windt, W. K. Waskiewicz, J. A. Liddle, and H. A. Huggins, "Stress in Multilayers and Thin Films," in Physics of X-Ray Multilayer Structures, Technical Digest Series (Optica Publishing Group, 1994), paper WA.2.

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Abstract

Thin films and multilayers are typically under stresses that are large enough to deform substrate surfaces by up to several nanometers. The origins of these stresses and measurement techniques will be discussed.

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