Abstract
Research on thin film deposited by atomic layer deposition (ALD) for laser damage resistance is rare. In this paper, it has been used to deposit films at and on fused silica and BK7 substrates. Microstructure of the thin films was investigated by x-ray diffraction. The laser-induced damage threshold (LIDT) of samples was measured by a damage test system. Damage morphology was studied under a Nomarski differential interference contrast microscope and further checked under an atomic force microscope. Multilayers deposited at different temperatures were compared. The results show that the films deposited by ALD had better uniformity and transmission; in this paper, the uniformity is better than 99% over samples, and the transmission is more than 99.8% at . Deposition temperature affects the deposition rate and the thin film microstructure and further influences the LIDT of the thin films. As to the films, the LIDTs were and at on fused silica and BK7 substrates, respectively. The LIDTs at are notably better than .
© 2011 Optical Society of America
Full Article | PDF ArticleMore Like This
Ling-Shan Gao, Qing-Yuan Cai, Er-Tao Hu, Qiu-Yu Zhang, Yu-Ting Yang, Yun-Bo Xiong, Bao-Jian Liu, Wei-Bo Duan, Tian-Yan Yu, and Ding-Quan Liu
Opt. Express 31(8) 13503-13517 (2023)
Zhichao Liu, Songlin Chen, Ping Ma, Yaowei Wei, Yi Zheng, Feng Pan, Hao Liu, and Gengyu Tang
Opt. Express 20(2) 854-863 (2012)
Adriana Szeghalmi, Michael Helgert, Robert Brunner, Frank Heyroth, Ulrich Gösele, and Mato Knez
Appl. Opt. 48(9) 1727-1732 (2009)