A High-Power, Low-Noise, Ultraviolet Laser System for Trapped-Ion Quantum Computing

R. I. Tobey; K. W. Lee; A. M. Hankin; D. N. Gresh; D. J. Francois; J. G. Bohnet; D. Hayes; M. J. Bohn

doi:10.1364/CLEO_AT.2020.AF3K.3

Conference on Lasers and Electro-Optics
OSA Technical Digest (Optica Publishing Group, 2020),
paper AF3K.3
•https://doi.org/10.1364/CLEO_AT.2020.AF3K.3

A High-Power, Low-Noise, Ultraviolet Laser System for Trapped-Ion Quantum Computing

R. I. Tobey, K. W. Lee, A. M. Hankin, D. N. Gresh, D. J. Francois, J. G. Bohnet, D. Hayes, and M. J. Bohn

CLEO: Applications and Technology 2020

Washington, DC United States
10–15 May 2020
ISBN: 978-1-943580-76-7

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Quantum Sensing and Enabling Instrumentation (AF3K)

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R. I. Tobey, K. W. Lee, A. M. Hankin, D. N. Gresh, D. J. Francois, J. G. Bohnet, D. Hayes, and M. J. Bohn, "A High-Power, Low-Noise, Ultraviolet Laser System for Trapped-Ion Quantum Computing," in Conference on Lasers and Electro-Optics, OSA Technical Digest (Optica Publishing Group, 2020), paper AF3K.3.

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Abstract

We demonstrate a high power, modular, bichromatic, ultraviolet laser system based on the Master Oscillator / Power Amplifier (MOPA) configuration for quantum computing with ¹⁷¹Yb⁺ ions. Low phase noise allows for high fidelity qubit operations.

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