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Low-refractive-index indium–tin–oxyfluoride thin films made by high-rate reactive dc magnetron sputtering

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Abstract

Indium–tin–oxyfluoride (ITOF) films were prepared by dc magnetron sputtering of indium–tin in Ar + O2 + CF4. Spectrophotometric measurements in the 0.2–2.5-μm wavelength range were used to evaluate the dielectric function. Wide band gap ITOF, with a refractive index of ~1.5 in the visible and good durability, was produced at a rate of ~1.2 nms−1. ITOF is well suited for antireflecting transparent and conducting indium–tin–oxide coatings.

© 1988 Optical Society of America

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