Computational manufacturing as a tool for the selection of the most manufacturable design

Tatiana V. Amotchkina; Sebastian Schlichting; Henrik Ehlers; Michael K. Trubetskov; Alexander V. Tikhonravov; Detlev Ristau

doi:10.1364/AO.51.008677

Applied Optics
Vol. 51,
Issue 36,
pp. 8677-8686
(2012)
•https://doi.org/10.1364/AO.51.008677

Computational manufacturing as a tool for the selection of the most manufacturable design

Tatiana V. Amotchkina, Sebastian Schlichting, Henrik Ehlers, Michael K. Trubetskov, Alexander V. Tikhonravov, and Detlev Ristau

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Tatiana V. Amotchkina, Sebastian Schlichting, Henrik Ehlers, Michael K. Trubetskov, Alexander V. Tikhonravov, and Detlev Ristau, "Computational manufacturing as a tool for the selection of the most manufacturable design," Appl. Opt. 51, 8677-8686 (2012)

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Abstract

Applications of computational manufacturing experiments (CMEs) for selection of the most manufacturable designs among a variety of different design solutions are demonstrated. We compare design solutions with respect to estimations of their production yields. Computational experiments are performed using two simulation software tools. In the course of CMEs, we take into account all major factors causing errors in our deposition process. Real deposition experiments are in agreement with CMEs; the most manufacturable design exhibits better target performances compared to other designs.

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Layer Number	Physical Thickness (nm)					Material
Layer Number	EF1	EF2	EF3	EF4	EF5	Material
1	36.24	60.09	65.25	41.37	80.21	${TiO}_{2}$
2	153.83	290.72	288.59	137.35	308.90	${SiO}_{2}$
3	154.98	72.09	73.36	160.27	28.74	${TiO}_{2}$
4	156.98	135.66	128.54	142.52	163.59	${SiO}_{2}$
5	72.17	78.23	79.28	73.82	73.42	${TiO}_{2}$
6	95.23	288.88	286.67	115.32	128.62	${SiO}_{2}$
7	87.03	75.06	85.32	102.03	93.44	${TiO}_{2}$
8	540.78	163.93	146.30	78.89	247.76	${SiO}_{2}$
9	80.17	162.80	168.60	166.74	85.83	${TiO}_{2}$
10	126.78	154.93	146.08	131.41	126.30	${SiO}_{2}$
11	206.83	79.64	78.99	83.53	72.16	${TiO}_{2}$
12	130.90	338.21	345.50	116.44	126.07	${SiO}_{2}$
13	84.93	90.48	85.95	73.16	78.09	${TiO}_{2}$
14	263.24	271.75	275.82	138.55	218.22	${SiO}_{2}$
15	84.56	84.37	86.84	310.11	121.98	${TiO}_{2}$
16	128.30	132.24	123.60	136.29	129.54	${SiO}_{2}$
17	71.90	72.42	75.46	71.01	73.15	${TiO}_{2}$
18	126.86	155.07	146.19	123.27	128.49	${SiO}_{2}$
19	79.18	303.13	308.24	80.60	76.70	${TiO}_{2}$
20	228.91	153.22	153.03	147.43	158.93	${SiO}_{2}$
21	121.10	74.82	74.62	145.64	137.15	${TiO}_{2}$
22	132.80	95.65	100.04	150.70	164.63	${SiO}_{2}$
23	76.52	50.93	52.90	82.92	78.51	${TiO}_{2}$
24	107.75	350.02	352.45	124.35	124.02	${SiO}_{2}$
25	46.38	78.66	69.79	82.25	62.80	${TiO}_{2}$
26	92.29	84.63	95.60	51.03	582.08	${SiO}_{2}$
27	78.00	30.00	30.00	63.46	57.77	${TiO}_{2}$
28	351.75			361.02	196.09	${SiO}_{2}$
29	30.00			50.02		${TiO}_{2}$
30				209.34		${SiO}_{2}$
	1309.99	1312.72	1334.6	1586.93	1119.95	$\sum {TiO}_{2}$
	2636.4	2614.91	2588.41	2163.91	2803.24	$\sum {SiO}_{2}$

Layer Number	Physical Thickness (nm)					Material
Layer Number	EF6	EF7	EF8	EF9	EF10	Material
1	35.76	189.01	30.28	16.73	197.05	${TiO}_{2}$
2	328.71	314.64	113.17	85.88	574.47	${SiO}_{2}$
3	76.77	74.08	331.66	792.12	69.22	${TiO}_{2}$
4	148.92	139.71	134.81	120.18	128.20	${SiO}_{2}$
5	148.27	188.73	49.78	781.71	87.80	${TiO}_{2}$
6	183.21	324.15	152.89	112.88	269.27	${SiO}_{2}$
7	65.37	78.93	221.60	69.98	90.14	${TiO}_{2}$
8	129.17	134.90	30.00	128.46	154.17	${SiO}_{2}$
9	62.05	87.48	209.89	327.67	166.71	${TiO}_{2}$
10	184.69	270.27	149.61	113.04	156.17	${SiO}_{2}$
11	143.69	92.30	85.03	71.54	74.44	${TiO}_{2}$
12	142.65	144.39	65.19	81.16	85.55	${SiO}_{2}$
13	70.99	172.38	90.42	80.69	104.56	${TiO}_{2}$
14	131.11	139.39	135.76	134.72	262.52	${SiO}_{2}$
15	74.27	76.85	166.59	321.44	82.01	${TiO}_{2}$
16	162.18	154.46	95.65	134.44	130.13	${SiO}_{2}$
17	148.01	152.11	87.27	70.34	82.82	${TiO}_{2}$
18	165.32	156.86	116.63	101.29	321.81	${SiO}_{2}$
19	202.96	76.44	71.48	52.87	212.27	${TiO}_{2}$
20	141.01	149.57	156.90	106.58	117.53	${SiO}_{2}$
21	79.36	163.40	306.82	332.44	206.71	${SiO}_{2}$
22	298.99	155.08	149.00		87.62	${TiO}_{2}$
23	78.14	70.33	70.96		48.52	${TiO}_{2}$
24	145.36	122.78	107.87		210.84	${SiO}_{2}$
25	29.96	33.82	43.40			${TiO}_{2}$
26	144.87	102.97	119.09			${SiO}_{2}$
27	45.99	58.05	208.91			${TiO}_{2}$
28	113.66	209.38	99.81			${SiO}_{2}$
29	29.96		30.28			${TiO}_{2}$
	1291.52	1513.90	2004.37	2917.53	1422.24	$\sum {TiO}_{2}$
	2419.84	2518.56	1626.38	1118.65	2498.29	$\sum {SiO}_{2}$

Deposition	Number of Layers	TOT at $λ = 750 nm$	Merit Function
EF1	29	3946.4	0.43
EF2	27	3927.6	0.85
EF3	27	3923.0	0.47
EF4	30	3750.8	0.29
EF5	28	3923.2	0.55
EF6	29	3711.4	0.47
EF7	28	4032.5	0.61
EF8	29	3630.8	0.46
EF9	21	4036.2	0.73
EF10	24	3920.5	0.77

Design	Production Yield $Y$ (%)
Design	BBM OL	BBM LZH
EF1	95	80
EF2	38	40
EF3	52	50
EF4	75	70
EF5	67	50
EF6	45	25
EF7	100	100
EF8	100	100
EF9	35	50
EF10	25	15

Design Run	${DF}_{0}$	GDF	${DF}^{t}$
EF7–Run1	2.4	1.7	6.3
EF7–Run2	2.7	1.8	6.2
EF7–Run3	2.3	1.7	6.3
EF8–Run1	3.88	2.52	6.7
EF8–Run2	3.6	2.21	7.3
EF2	3.3	2.1	6.6
EF10	3.18	1.8	7.5

Abstract

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Applied Optics

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