Abstract

Due to the advantages of being non-contact, non-destructive, highly efficient, and low in cost, scatterometry has emerged as a powerful technique for nanostructure metrology. In this paper, we propose an angle-resolved scatterometer composed of a scattered light acquisition channel and a spatial imaging channel, which is capable of detecting multi-order diffracted light in a single measurement. Since the high numerical aperture objective lens is usually employed in an angle-resolved scatterometer, the polarization effect of the objective lens introduced by the non-normal incidence and installation stress should be considered. An in-situ calibration method for the objective lens’s polarization effects is proposed, in which a known analyzer is appended to the output light path to enable the extraction of the ellipsometric parameters of isotropic samples. Then the polarization effect of the objective lens can be determined in-situ by fitting the measured ellipsometric parameters to the calculated ones. With the objective lens polarization effect being considered, significant improvements in the accuracy and repeatability precision can be achieved in the metrology of the film thickness and grating topography parameters.

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