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Boron carbide thin film surface characterization after graphitic carbon removal using low-pressure oxygen gas RF plasma

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Abstract

${\rm B}_4{\rm C}$-coated thin film mirrors are used in high brilliance synchrotron and x-ray free electron laser beamlines due to their low absorption coefficient and high thermal stability. As in the case of gold, platinum, and other thin film mirrors, ${{\rm B}_4}{\rm C}$-coated mirrors also are affected due to synchrotron radiation-induced carbon contaminations in beamlines. In the present study, a graphitic carbon (${\rm C}$) layer deposited on top of boron carbide (${{\rm B}_x}{\rm C}$) thin film surface is removed by five successive oxygen radio frequency (RF) plasma exposures (RF power, 10 W; ${{\rm O}_2}$ flow, 30 sccm; exposure time, 10 min each). Before and after the carbon layer removal, structural and compositional properties of the ${{\rm B}_x}{\rm C}/{\rm C}$ bilayer are characterized by soft x-ray reflectivity, x-ray photoelectron spectroscopy, grazing angle x-ray diffraction, and Raman spectroscopy techniques. Characterization results reveal that in the first four exposures the carbon layer thickness decreases continuously without affecting the ${{\rm B}_x}{\rm C}$ layer properties; however, in the fifth exposure, the carbon layer is completely removed along with a partial etching of the ${{\rm B}_x}{\rm C}$ layer too.

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Data underlying the results presented in this paper are not publicly available at this time but may be obtained from the authors upon reasonable request.

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