Abstract

The enhanced technique of quartz surface nano-local etching is considered. The enhancement of an evanescent field above surface protrusions and, as a result, an increase in the rate of quartz nano-local etching, are proposed. The possibility to reduce the amount of etch products filled in rough surface troughs and control the optimal rate of the surface nano-polishing process is achieved. The dependences of the quartz surface profile evolution on the initial values of surface roughness parameters, on the refractive index of the medium containing molecular chlorine and contacting the quartz surface, and on the wavelength of radiation illuminating this surface are shown.

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