Abstract

A model for photochemical polishing of a rough quartz surface has been developed that uses the near field rising above a given surface under the action of electromagnetic radiation. The model allows solving the problem of predicting the results without the need for time-consuming calculations. Simulation of the etching of the quartz surface profile in the spatial frequency domain is used. The features of the surface profile evolution are analyzed, and the dependences of this evolution on the initial correlation length and standard deviation of a rough quartz surface profile as well as radiation wavelength are shown.

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Enhanced technique for photochemical nano-polishing of a rough quartz surface: the numerical calculation of profile evolution

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