W. Yu, X. C. Yuan, N. Q. Ngo, W. Que, W. C. Cheong, and V. Koudriachov, “Single-step fabrication of continuous surface relief micro-optical elements in hybrid sol-gel glass by laser direct writing,” Opt. Express 10, 443–448 (2002), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-10-10-443.
[Crossref]
[PubMed]
Y. Xie, Z. Lu, F. Li, J. Zhao, and Z. Weng, “Lithographic fabrication of large diffractive optical elements on a concave lens surface,” Opt. Express 10, 1043–1047 (2002), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-10-20-1043.
[Crossref]
[PubMed]
J. R. Salgueiro, V. Moreno, and J. Linares, “Model of linewidth for laser writing on a photoresist,” Appl. Opt. 41, 895–901 (2002).
[Crossref]
[PubMed]
A. Poleshchuk and J. Burge, “Polar coordinate writing systems: error analysis of fabricated DOEs,” in Lithographic and Micromachining Techniques for Optical component Fabrication, E.-B. Kley and H. Peter Herzig, eds., Proc. SPIE 4440, 161–172 (2001).
[Crossref]
D. B. Chrisey, “The power of direct writing,” Science 289, 879–881 (2000).
[Crossref]
D. Bauerle, Laser Processing and Chemistry, 2nd. ed. (Springer-Verlag, Berlin, 1996).
W. H. Hamaker, G. Burns, and P. Buch, “Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems,” in 15th Annual BACUS Symposium on Photomask Technology and Management, G. Shelden and J. Wiley, eds., Proc. SPIE2621, 319–328 (1995).
[Crossref]
A. Poleshchuk and J. Burge, “Polar coordinate writing systems: error analysis of fabricated DOEs,” in Lithographic and Micromachining Techniques for Optical component Fabrication, E.-B. Kley and H. Peter Herzig, eds., Proc. SPIE 4440, 161–172 (2001).
[Crossref]
W. H. Hamaker, G. Burns, and P. Buch, “Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems,” in 15th Annual BACUS Symposium on Photomask Technology and Management, G. Shelden and J. Wiley, eds., Proc. SPIE2621, 319–328 (1995).
[Crossref]
D. B. Chrisey, “The power of direct writing,” Science 289, 879–881 (2000).
[Crossref]
W. H. Hamaker, G. Burns, and P. Buch, “Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems,” in 15th Annual BACUS Symposium on Photomask Technology and Management, G. Shelden and J. Wiley, eds., Proc. SPIE2621, 319–328 (1995).
[Crossref]
S. M. Metev and V. P. Veiko, Laser-Assisted Micro-Technology, 2nd, ed. (Springer-Verlag, Berlin, 1998).
[Crossref]
A. Poleshchuk and J. Burge, “Polar coordinate writing systems: error analysis of fabricated DOEs,” in Lithographic and Micromachining Techniques for Optical component Fabrication, E.-B. Kley and H. Peter Herzig, eds., Proc. SPIE 4440, 161–172 (2001).
[Crossref]
S. M. Metev and V. P. Veiko, Laser-Assisted Micro-Technology, 2nd, ed. (Springer-Verlag, Berlin, 1998).
[Crossref]
W. Yu, X. C. Yuan, N. Q. Ngo, W. Que, W. C. Cheong, and V. Koudriachov, “Single-step fabrication of continuous surface relief micro-optical elements in hybrid sol-gel glass by laser direct writing,” Opt. Express 10, 443–448 (2002), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-10-10-443.
[Crossref]
[PubMed]
Y. Xie, Z. Lu, F. Li, J. Zhao, and Z. Weng, “Lithographic fabrication of large diffractive optical elements on a concave lens surface,” Opt. Express 10, 1043–1047 (2002), http://www.opticsexpress.org/abstract.cfm?URI=OPEX-10-20-1043.
[Crossref]
[PubMed]
A. Poleshchuk and J. Burge, “Polar coordinate writing systems: error analysis of fabricated DOEs,” in Lithographic and Micromachining Techniques for Optical component Fabrication, E.-B. Kley and H. Peter Herzig, eds., Proc. SPIE 4440, 161–172 (2001).
[Crossref]
D. B. Chrisey, “The power of direct writing,” Science 289, 879–881 (2000).
[Crossref]
D. Bauerle, Laser Processing and Chemistry, 2nd. ed. (Springer-Verlag, Berlin, 1996).
S. M. Metev and V. P. Veiko, Laser-Assisted Micro-Technology, 2nd, ed. (Springer-Verlag, Berlin, 1998).
[Crossref]
W. H. Hamaker, G. Burns, and P. Buch, “Optimizing the use of multipass printing to minimize printing errors in advanced laser reticle-writing systems,” in 15th Annual BACUS Symposium on Photomask Technology and Management, G. Shelden and J. Wiley, eds., Proc. SPIE2621, 319–328 (1995).
[Crossref]